Investigation of a high-current pulsed magnetron discharge initiated in the low-pressure diffuse arc plasma

Author

Bugaev, S.P. ; Koval, N.N. ; Sochugov, N.S. ; Zakharov, A.N.

Author_Institution

Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia

Volume

2

fYear

1996

fDate

21-26 Jul 1996

Firstpage

1074

Abstract

The paper presents the results of a study of a pulsed high-current magnetron discharge used for deposition of thin metallic films. The current-voltage characteristic of this type of discharge and its range of occurence have been investigated in relation to the magnetic field induction, the cathode material and the preionization plasma density. High-frequency oscillations of the voltage across the magnetron sputtering system caused by the repetitive variation in the conductance of the cathode-anode gap have been discovered. The achieved pulsed deposition rate for copper is 11 μm/min

Keywords

copper; electric breakdown; magnetrons; metallic thin films; plasma density; plasma deposited coatings; plasma deposition; sputter deposition; sputtered coatings; vacuum arcs; vacuum breakdown; vacuum insulation; Cu; HF voltage oscillations; cathode material; cathode-anode gap conductance; high-current pulsed magnetron discharge; low-pressure diffuse arc plasma; magnetic field induction; magnetron sputtering; preionization plasma density; pulsed deposition rate; thin metallic film deposition; Cathodes; Conducting materials; Copper; Current-voltage characteristics; Magnetic fields; Magnetic films; Magnetic materials; Plasma density; Sputtering; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on

Conference_Location

Berkeley, CA

Print_ISBN

0-7803-2906-6

Type

conf

DOI

10.1109/DEIV.1996.545530

Filename

545530