• DocumentCode
    22274
  • Title

    Piezoresistive pressure sensors fabricated by surface micromachining process compatible with CMOS process

  • Author

    Huiyang Yu ; Ming Qin

  • Author_Institution
    Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing, China
  • Volume
    49
  • Issue
    13
  • fYear
    2013
  • fDate
    June 20 2013
  • Firstpage
    827
  • Lastpage
    829
  • Abstract
    A piezoresistive pressure sensor has been fabricated with a newly proposed fabrication process, which is quite suitable for fabricating MEMS devices. The fabricated pressure sensors are wire-bonded and have been tested under the pressure range from 100-1012 hPa. The results show that the output voltage increases with the applied pressure. For the structures with membrane length of 800 and 900 μm, the output voltage is linear to the pressure applied and the sensitivity of the sensor is about 0.75 and 0.877 mV/hPa. The test results also show that, in order to get a linear output, the membrane length should be less than 1000 μm.
  • Keywords
    CMOS integrated circuits; micromachining; microsensors; piezoelectric devices; pressure sensors; CMOS process; MEMS devices; fabrication process; piezoresistive pressure sensors; pressure 100 hPa to 1012 hPa; sensor sensitivity; size 800 mum; size 900 mum; surface micromachining process; wire-bonding;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2013.1396
  • Filename
    6553042