DocumentCode
22274
Title
Piezoresistive pressure sensors fabricated by surface micromachining process compatible with CMOS process
Author
Huiyang Yu ; Ming Qin
Author_Institution
Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing, China
Volume
49
Issue
13
fYear
2013
fDate
June 20 2013
Firstpage
827
Lastpage
829
Abstract
A piezoresistive pressure sensor has been fabricated with a newly proposed fabrication process, which is quite suitable for fabricating MEMS devices. The fabricated pressure sensors are wire-bonded and have been tested under the pressure range from 100-1012 hPa. The results show that the output voltage increases with the applied pressure. For the structures with membrane length of 800 and 900 μm, the output voltage is linear to the pressure applied and the sensitivity of the sensor is about 0.75 and 0.877 mV/hPa. The test results also show that, in order to get a linear output, the membrane length should be less than 1000 μm.
Keywords
CMOS integrated circuits; micromachining; microsensors; piezoelectric devices; pressure sensors; CMOS process; MEMS devices; fabrication process; piezoresistive pressure sensors; pressure 100 hPa to 1012 hPa; sensor sensitivity; size 800 mum; size 900 mum; surface micromachining process; wire-bonding;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2013.1396
Filename
6553042
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