DocumentCode :
2229877
Title :
Ultrathin optomechanical SiNx nanomembranes with photonic crystal fano resonances for enhanced radiation pressure
Author :
Bui, Catvu H. ; Zheng, Jiangjun ; Kositsky, Israel-Marc ; Lee, Lennon ; Harris, Jack ; Wong, Chee Wei
Author_Institution :
Opt. Nanostruct. Lab., Columbia Univ., New York, NY, USA
fYear :
2011
fDate :
1-6 May 2011
Firstpage :
1
Lastpage :
2
Abstract :
We fabricate 50-nm-thick SiNx photonic crystal nanomembranes for cavity quantum optomechanics, supported by complete ab-initio numerical simulations. Broadband normal incidence transmission measurements demonstrate Fano-type guided resonances near 1064-nm for enhanced reflectivity and radiation pressure effects.
Keywords :
ab initio calculations; membranes; nanophotonics; nanostructured materials; optical fabrication; optical materials; photonic crystals; reflectivity; silicon compounds; transparency; SiNx; ab-initio numerical simulation; broadband normal incidence transmission; cavity quantum optomechanics; photonic crystal Fano resonances; photonic crystal nanomembranes; radiation pressure effects; reflectivity; size 50 nm; ultrathin optomechanical nanomembranes fabrication; wavelength 1064 nm; Optical device fabrication; Optical fibers; Optical imaging; Reflectivity; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4577-1223-4
Type :
conf
Filename :
5950219
Link To Document :
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