• DocumentCode
    2229877
  • Title

    Ultrathin optomechanical SiNx nanomembranes with photonic crystal fano resonances for enhanced radiation pressure

  • Author

    Bui, Catvu H. ; Zheng, Jiangjun ; Kositsky, Israel-Marc ; Lee, Lennon ; Harris, Jack ; Wong, Chee Wei

  • Author_Institution
    Opt. Nanostruct. Lab., Columbia Univ., New York, NY, USA
  • fYear
    2011
  • fDate
    1-6 May 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We fabricate 50-nm-thick SiNx photonic crystal nanomembranes for cavity quantum optomechanics, supported by complete ab-initio numerical simulations. Broadband normal incidence transmission measurements demonstrate Fano-type guided resonances near 1064-nm for enhanced reflectivity and radiation pressure effects.
  • Keywords
    ab initio calculations; membranes; nanophotonics; nanostructured materials; optical fabrication; optical materials; photonic crystals; reflectivity; silicon compounds; transparency; SiNx; ab-initio numerical simulation; broadband normal incidence transmission; cavity quantum optomechanics; photonic crystal Fano resonances; photonic crystal nanomembranes; radiation pressure effects; reflectivity; size 50 nm; ultrathin optomechanical nanomembranes fabrication; wavelength 1064 nm; Optical device fabrication; Optical fibers; Optical imaging; Reflectivity; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2011 Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-4577-1223-4
  • Type

    conf

  • Filename
    5950219
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2229877