Bulk micromachined electrostatic beam steering micromirror array

Author

Dokmeci, M.R. ; Bakshi, S. ; Waelti, M. ; Pareek, A. ; Fung, C. ; Mastrangelo, C.H.

Author_Institution

Corning Intellisense, Wilmington, MA, USA

fYear

2002

fDate

20-23 Aug. 2002

Firstpage

15

Lastpage

16

Abstract

Large area, 320-mirror arrays have been fabricated using a combination of bulk micromachining of SOI wafers and anodic bonding. Each silicon mirror is 750/spl times/800 /spl mu/m/sup 2/ and 14 /spl mu/m thick, coated with a /spl sim/0.1 /spl mu/m-thick layer of Au. The bulk silicon mirrors are electrostatically actuated with shaped parallel plate electrodes placed 86 /spl mu/m below, and they can be stably oriented anywhere in a /spl plusmn/5/spl deg/ (mechanical) two-dimensional box with voltage drives as low as 60 V.

Keywords

electrostatic actuators; microelectrodes; micromachining; micromirrors; optical arrays; silicon-on-insulator; 0.1 micron; 14 micron; 60 V; 86 micron; SOI wafers; Si; anodic bonding; bulk micromachining; electrostatic beam steering; large-area mirror arrays; micromirror array; shaped parallel plate electrodes; two-dimensional box; voltage drives; Beam steering; Electrodes; Electrostatics; Gold; Low voltage; Micromachining; Micromirrors; Mirrors; Silicon; Wafer bonding;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on

Conference_Location

Lugano, Switzerland

Print_ISBN

0-7803-7595-5

Type

conf

DOI

10.1109/OMEMS.2002.1031421

Filename

1031421