DocumentCode
2231210
Title
Fabrication of high-NA GaN diffractive microlenses
Author
Chii-Chang Chen ; Ming-Hung Li ; Chih-Yang Chang ; Gou-Chung Chi ; Jenq-Yang Chang ; Wei-Tai Cheng ; Jui-Hung Yeh ; Chuck Wu
Author_Institution
Dept. of Phys., Nat. Central Univ., Chung-li, Taiwan
fYear
2002
fDate
20-23 Aug. 2002
Firstpage
67
Lastpage
68
Abstract
We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.
Keywords
III-V semiconductors; gallium compounds; masks; microlenses; optical fabrication; sputter etching; GaN; fabrication method; gray-level mask; high-NA GaN diffractive microlens; high-density optical data storage; inductively coupled plasma etching; Etching; Gallium nitride; Lenses; Microoptics; Optical coupling; Optical design; Optical device fabrication; Optical diffraction; Plasma applications; Plasma materials processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
Conference_Location
Lugano, Switzerland
Print_ISBN
0-7803-7595-5
Type
conf
DOI
10.1109/OMEMS.2002.1031446
Filename
1031446
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