DocumentCode
2231601
Title
Deviations in absorber shape of electron beam lithography using the example of LIGA-microspectrometers
Author
Last, A. ; Hein, H. ; Mohr, J.
Author_Institution
Inst. for Microstructure Technol., Res. Centre Karlsruhe, Germany
fYear
2002
fDate
20-23 Aug. 2002
Firstpage
105
Lastpage
106
Abstract
E-beam lithographically produced masks used in the production of micro-optic structures must have a defined and high precision. Using the example of microspectrometers, the measurement deviations were studied, and correlated with the corresponding E-beam patterns.
Keywords
LIGA; electron beam lithography; masks; micro-optics; optical fabrication; spectrometers; LIGA microspectrometer; MOEMS technology; absorber shape; electron beam lithography; mask; micro-optic structure; Design automation; Distance measurement; Electron beams; Gratings; Motion measurement; Shape; Size measurement; Teeth; Testing; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
Conference_Location
Lugano, Switzerland
Print_ISBN
0-7803-7595-5
Type
conf
DOI
10.1109/OMEMS.2002.1031465
Filename
1031465
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