Title :
Deviations in absorber shape of electron beam lithography using the example of LIGA-microspectrometers
Author :
Last, A. ; Hein, H. ; Mohr, J.
Author_Institution :
Inst. for Microstructure Technol., Res. Centre Karlsruhe, Germany
Abstract :
E-beam lithographically produced masks used in the production of micro-optic structures must have a defined and high precision. Using the example of microspectrometers, the measurement deviations were studied, and correlated with the corresponding E-beam patterns.
Keywords :
LIGA; electron beam lithography; masks; micro-optics; optical fabrication; spectrometers; LIGA microspectrometer; MOEMS technology; absorber shape; electron beam lithography; mask; micro-optic structure; Design automation; Distance measurement; Electron beams; Gratings; Motion measurement; Shape; Size measurement; Teeth; Testing; Writing;
Conference_Titel :
Optical MEMs, 2002. Conference Digest. 2002 IEEE/LEOS International Conference on
Conference_Location :
Lugano, Switzerland
Print_ISBN :
0-7803-7595-5
DOI :
10.1109/OMEMS.2002.1031465
