• DocumentCode
    2231821
  • Title

    Fabrication of nanophotonic circuit components by thermal nano imprint lithography

  • Author

    Scheerlinck, Stijn ; Pedersen, Rasmus Haugstrup ; Dumon, Pieter ; Bogaerts, Wim ; Plachetka, Ulrich ; Thourhout, Dries Van ; Baets, Roel ; Kristensen, Anders

  • Author_Institution
    Photonics Res. Group, Ghent Univ., Ghent
  • fYear
    2008
  • fDate
    4-9 May 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency.
  • Keywords
    Mach-Zehnder interferometers; diffraction gratings; integrated optoelectronics; nanolithography; optical couplers; optical fabrication; silicon-on-insulator; soft lithography; Si-SiO2; grating couplers; nanophotonic circuit component fabrication; silicon-on-insulator Mach-Zehnder interferometer; thermal nanoimprint lithography; two-step imprint process; Circuits; Etching; Fabrication; Fiber gratings; Lithography; Optical coupling; Optical fiber couplers; Optical waveguides; Silicon; Substrates; (050.2770) Gratings; (130.3120) Integrated optics devices;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-859-9
  • Type

    conf

  • Filename
    4571274
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2231821