DocumentCode
2232570
Title
S-shaped negative differential resistance modeling in electro-thermal simulation of phase-change memory programming
Author
Chen, F. ; Chao, D.S. ; Chen, M.-J. ; Yen, P. ; Yeh, J.-T. ; Lee, C.-M. ; Wang, W.-H. ; Kao, M.-J. ; Tsai, M.-J.
Author_Institution
Ind. Technol. Res. Inst., Hsinchu
fYear
2007
fDate
10-13 Nov. 2007
Firstpage
67
Lastpage
70
Abstract
Electro-thermal modeling has been commonly employed to model the RESET (crystalline-to-amorphous) transition in phase-change memory devices. However, to fully model the SET (amorphous-to-crystalline) transition, it is required to comprehend the S-shaped negative differential resistance (NDR) that precedes the phase transition, as input current is ramped up. Carrier dynamics on nanosecond time scales have been invoked to model the "snapback" phenomenon. To build S-shaped NDR models within commercial electrothermal simulation packages, we consider various resistivity models which may be calibrated to provide a good flt with experimental data. We find that regardless of the model, it is necessary to include a constant offset in the resistivity formula, in order to consistently obtain the observed ON state portion of the l-V curve.
Keywords
phase change materials; shared memory systems; S-shaped negative differential resistance modeling; electro-thermal simulation; phase-change memory programming; Amorphous materials; Conductivity; Crystallization; Electric resistance; Electrothermal effects; Packaging; Phase change materials; Phase change memory; Probes; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Memory Technology Symposium, 2007. NVMTS '07
Conference_Location
Albuquerque, NM
Print_ISBN
978-1-4244-1361-4
Type
conf
DOI
10.1109/NVMT.2007.4389949
Filename
4389949
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