• DocumentCode
    2232570
  • Title

    S-shaped negative differential resistance modeling in electro-thermal simulation of phase-change memory programming

  • Author

    Chen, F. ; Chao, D.S. ; Chen, M.-J. ; Yen, P. ; Yeh, J.-T. ; Lee, C.-M. ; Wang, W.-H. ; Kao, M.-J. ; Tsai, M.-J.

  • Author_Institution
    Ind. Technol. Res. Inst., Hsinchu
  • fYear
    2007
  • fDate
    10-13 Nov. 2007
  • Firstpage
    67
  • Lastpage
    70
  • Abstract
    Electro-thermal modeling has been commonly employed to model the RESET (crystalline-to-amorphous) transition in phase-change memory devices. However, to fully model the SET (amorphous-to-crystalline) transition, it is required to comprehend the S-shaped negative differential resistance (NDR) that precedes the phase transition, as input current is ramped up. Carrier dynamics on nanosecond time scales have been invoked to model the "snapback" phenomenon. To build S-shaped NDR models within commercial electrothermal simulation packages, we consider various resistivity models which may be calibrated to provide a good flt with experimental data. We find that regardless of the model, it is necessary to include a constant offset in the resistivity formula, in order to consistently obtain the observed ON state portion of the l-V curve.
  • Keywords
    phase change materials; shared memory systems; S-shaped negative differential resistance modeling; electro-thermal simulation; phase-change memory programming; Amorphous materials; Conductivity; Crystallization; Electric resistance; Electrothermal effects; Packaging; Phase change materials; Phase change memory; Probes; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium, 2007. NVMTS '07
  • Conference_Location
    Albuquerque, NM
  • Print_ISBN
    978-1-4244-1361-4
  • Type

    conf

  • DOI
    10.1109/NVMT.2007.4389949
  • Filename
    4389949