• DocumentCode
    2232948
  • Title

    Reflexion Supported Pyrometric Interferometry: Anew tool for in situ, real time temperature control in semiconductor manufacturing

  • Author

    Boebel, Friedrich G. ; Moller, Heino ; Preib, Walter

  • Author_Institution
    Fraunhofer Institute for Integrated Circuits, Germany
  • fYear
    1993
  • fDate
    18-19 Oct 1993
  • Firstpage
    130
  • Lastpage
    134
  • Keywords
    Error analysis; Integrated circuit manufacture; Manufacturing processes; Optical films; Optical interferometry; Semiconductor device manufacture; Semiconductor films; Silicon; Temperature control; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
  • Type

    conf

  • DOI
    10.1109/ASMC.1993.682496
  • Filename
    682496
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2232948