DocumentCode

2233204

Title

An Evaluation of 4X Reticles for 250nm DUV Lithography

Author

Sewell, Harry ; Deluca, Nicholas

Author_Institution

SVG Lithography, Wilton, Connecticut

fYear

1993

fDate

18-19 Oct 1993

Firstpage

135

Lastpage

135

Keywords

Lithography; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI

Type

conf

DOI

10.1109/ASMC.1993.682497

Filename

682497