Title :
An Evaluation of 4X Reticles for 250nm DUV Lithography
Author :
Sewell, Harry ; Deluca, Nicholas
Author_Institution :
SVG Lithography, Wilton, Connecticut
Keywords :
Lithography; Semiconductor device manufacture;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682497
