DocumentCode :
2233419
Title :
Interface quality control of monolithic photonic crystals by hydrogen annealing
Author :
Kim, Sora ; Kant, Rishi ; Hadzialic, Sanja ; Howe, Roger T. ; Solgaard, Olav
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA
fYear :
2008
fDate :
4-9 May 2008
Firstpage :
1
Lastpage :
2
Abstract :
We demonstrate that the optical characteristics of silicon photonic crystals can be modified by hydrogen annealing. Hydrogen annealed PCs show reduced surface roughness and improved structural uniformity, leading to increased reflectivity and sharper resonance peaks.
Keywords :
annealing; elemental semiconductors; hydrogen; infrared spectra; interface roughness; optical materials; photonic crystals; quality control; reflectivity; silicon; sputter etching; surface roughness; GOPHER process; H; RIE process; Si; hydrogen annealing; interface quality control; monolithic fabrication method; monolithic silicon photonic crystals; optical characteristics; optical reflection spectra; reflectivity; sharper resonance peaks; structural uniformity; surface roughness reduction; Annealing; Hydrogen; Personal communication networks; Photonic crystals; Quality control; Reflectivity; Resonance; Rough surfaces; Silicon; Surface roughness; 220.4000 Microstructure fabrication; 230.5298 Photonic crystals;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
Type :
conf
Filename :
4571343
Link To Document :
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