Interface quality control of monolithic photonic crystals by hydrogen annealing

Author

Kim, Sora ; Kant, Rishi ; Hadzialic, Sanja ; Howe, Roger T. ; Solgaard, Olav

Author_Institution

Dept. of Electr. Eng., Stanford Univ., Stanford, CA

fYear

2008

fDate

4-9 May 2008

Firstpage

1

Lastpage

2

Abstract

We demonstrate that the optical characteristics of silicon photonic crystals can be modified by hydrogen annealing. Hydrogen annealed PCs show reduced surface roughness and improved structural uniformity, leading to increased reflectivity and sharper resonance peaks.

Keywords

annealing; elemental semiconductors; hydrogen; infrared spectra; interface roughness; optical materials; photonic crystals; quality control; reflectivity; silicon; sputter etching; surface roughness; GOPHER process; H; RIE process; Si; hydrogen annealing; interface quality control; monolithic fabrication method; monolithic silicon photonic crystals; optical characteristics; optical reflection spectra; reflectivity; sharper resonance peaks; structural uniformity; surface roughness reduction; Annealing; Hydrogen; Personal communication networks; Photonic crystals; Quality control; Reflectivity; Resonance; Rough surfaces; Silicon; Surface roughness; 220.4000 Microstructure fabrication; 230.5298 Photonic crystals;

fLanguage

English

Publisher

iet

Conference_Titel

Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on

Conference_Location

San Jose, CA

Print_ISBN

978-1-55752-859-9

Type

conf

Filename

4571343