• DocumentCode
    2233803
  • Title

    Enhanced dielectric properties of Ca(Mg1/3Nb2/3)O3 / CaTiO3 multilayer heterogeneous thin films

  • Author

    Shen, J. ; Zhou, J. ; Zhu, J. ; Lei, Q. ; Wang, H. ; Zhang, C.Y. ; Chen, W.

  • Author_Institution
    Key Lab. of Adv. Technol. for Mater. Synthesis & Process., Wuhan Univ. of Technol., Wuhan, China
  • fYear
    2009
  • fDate
    23-27 Aug. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Ca(Mg1/3Nb2/3)O3/CaTiO3 (CMN/CT) heterostructure dielectric thin films, with the same thickness but different arrangement patterns, were prepared by Pechini method. The effects of the heterogeneous interface on the structure and properties have been studied. The results showed that, in non-alternating arrangement films, single perovskite phase can only be obtained in TM heterostructure film, in which CaTiO3 layer has grown on the substrate firstly, and the dielectric properties of this film is epsivr=47.5, tandelta=0.020 at 1MHz. Comparing with non-alternating arrangement film, all alternating arrangement films have single perovskite phase, and the existing of heterogeneous interface enhanced the dielectric properties of TMM and MMT alternating arrangement films by introducing space charges. And the dismatch between CMN and CT layers can avoid the harmful particle forming, improve crystallization and surface morphology, and keep the dielectric loss at a low level. At 1MHz, the dielectric constant (epsivr) of TMM and MMT films are 66.3 and 63.6, while both dielectric loss (tandelta) are 0.021.
  • Keywords
    calcium compounds; crystallisation; dielectric losses; dielectric thin films; interface structure; multilayers; permittivity; space charge; surface morphology; Ca(Mg0.33Nb0.66)O3-CaTiO3; Pechini method preparation; crystallization; dielectric constant; dielectric loss; dielectric multilayer; enhanced dielectric properties; heterostructure dielectric thin films; interface structure; nonalternating arrangement film; space charges; surface morphology; Crystallization; Dielectric constant; Dielectric losses; Dielectric substrates; Dielectric thin films; Laboratories; Materials science and technology; Niobium; Nonhomogeneous media; Transistors; CMN/CT heterostructure dielectric thin film; dielectric enhance; dielectric properties; heterogeneous interface;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2009. ISAF 2009. 18th IEEE International Symposium on the
  • Conference_Location
    Xian
  • ISSN
    1099-4734
  • Print_ISBN
    978-1-4244-4970-5
  • Electronic_ISBN
    1099-4734
  • Type

    conf

  • DOI
    10.1109/ISAF.2009.5307568
  • Filename
    5307568