DocumentCode
2233803
Title
Enhanced dielectric properties of Ca(Mg1/3 Nb2/3 )O3 / CaTiO3 multilayer heterogeneous thin films
Author
Shen, J. ; Zhou, J. ; Zhu, J. ; Lei, Q. ; Wang, H. ; Zhang, C.Y. ; Chen, W.
Author_Institution
Key Lab. of Adv. Technol. for Mater. Synthesis & Process., Wuhan Univ. of Technol., Wuhan, China
fYear
2009
fDate
23-27 Aug. 2009
Firstpage
1
Lastpage
4
Abstract
Ca(Mg1/3Nb2/3)O3/CaTiO3 (CMN/CT) heterostructure dielectric thin films, with the same thickness but different arrangement patterns, were prepared by Pechini method. The effects of the heterogeneous interface on the structure and properties have been studied. The results showed that, in non-alternating arrangement films, single perovskite phase can only be obtained in TM heterostructure film, in which CaTiO3 layer has grown on the substrate firstly, and the dielectric properties of this film is epsivr=47.5, tandelta=0.020 at 1MHz. Comparing with non-alternating arrangement film, all alternating arrangement films have single perovskite phase, and the existing of heterogeneous interface enhanced the dielectric properties of TMM and MMT alternating arrangement films by introducing space charges. And the dismatch between CMN and CT layers can avoid the harmful particle forming, improve crystallization and surface morphology, and keep the dielectric loss at a low level. At 1MHz, the dielectric constant (epsivr) of TMM and MMT films are 66.3 and 63.6, while both dielectric loss (tandelta) are 0.021.
Keywords
calcium compounds; crystallisation; dielectric losses; dielectric thin films; interface structure; multilayers; permittivity; space charge; surface morphology; Ca(Mg0.33Nb0.66)O3-CaTiO3; Pechini method preparation; crystallization; dielectric constant; dielectric loss; dielectric multilayer; enhanced dielectric properties; heterostructure dielectric thin films; interface structure; nonalternating arrangement film; space charges; surface morphology; Crystallization; Dielectric constant; Dielectric losses; Dielectric substrates; Dielectric thin films; Laboratories; Materials science and technology; Niobium; Nonhomogeneous media; Transistors; CMN/CT heterostructure dielectric thin film; dielectric enhance; dielectric properties; heterogeneous interface;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2009. ISAF 2009. 18th IEEE International Symposium on the
Conference_Location
Xian
ISSN
1099-4734
Print_ISBN
978-1-4244-4970-5
Electronic_ISBN
1099-4734
Type
conf
DOI
10.1109/ISAF.2009.5307568
Filename
5307568
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