Title :
Hybrid Lithography System Using E-beam Direct Writer And Optical Stepper
Author :
Kaneko, Toshio ; Shibata, Yukinobu ; Sakitani, Yoshio ; Kurosaki, Toshiei
Author_Institution :
Electronic Device Manufacturing Equipment & Engineering Div., Japan
Keywords :
Costs; Design automation; Economics; Lithography; Mass production; Optical filters; Resists; Semiconductor devices; Stability; Throughput;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682500
