Title :
A New High Density Plasma Etching System Using A Dipole-ring Magnet (DRM)
Author :
Ohiwa, Tokuhisa ; Hasegawa, Isahiro ; Sekine, Makoto
Author_Institution :
Research and Development Center, Toshiba Corporation, Kawasaki
Keywords :
Degradation; Etching; Gaussian processes; Magnetic field measurement; Magnetic fields; Magnetic flux leakage; Magnetic semiconductors; Permanent magnets; Plasma applications; Plasma density;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682501
