Title :
Process Improvements and Empowerment in a Vlsi Pilot Line
Author :
Conway, J. ; Maimon, J. ; Nixon, P. ; Polavarapu, M.
Author_Institution :
IBM Federal Systems Company, Manassas, Virginia
Keywords :
ISO standards; Integrated circuit manufacture; Lithography; Manufacturing processes; Qualifications; Semiconductor device manufacture; Six sigma; Time measurement; Total quality management; Very large scale integration;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682504
