Fabrication and modal analysis of ion-implanted LiNbO3 ridge optical waveguide for integrated Erbium-doped amplifiers

Author

Malacarne, A. ; Sher, S.M. ; Montanari, G.B. ; Sugliani, S. ; Porzi, C. ; Potì, L.

Author_Institution

Scuola Superiore Sant´´ Anna, Pisa, Italy

fYear

2009

fDate

15-19 Sept. 2009

Firstpage

1

Lastpage

2

Abstract

The technological process, based on ion implantation and selective etching, for producing ridge waveguides on Lithium Niobate substrates is described and successfully applied. The parameters of the fabricated samples are used in a comprehensive FEM-based modal analysis of an Erbium-doped Lithium Niobate ridge waveguide. Simulation results support the concept of strong mode confinement at pump wavelength (980 nm) and single mode operation at signal (1550 nm) wavelength.

Keywords

erbium; etching; finite element analysis; ion implantation; lithium compounds; modal analysis; optical fabrication; optical pumping; optical waveguides; refractive index; ridge waveguides; FEM; LiNbO₃:Er; finite element method; ion implantation; modal analysis; mode confinement; refractive index; ridge optical waveguide; selective etching; wavelength 1550 nm; wavelength 980 nm; Etching; Fabrication; Modal analysis; Nonlinear optics; Optical pumping; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Refractive index; Er-Doped; Lithium Niobate; Optical waveguide;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics in Switching, 2009. PS '09. International Conference on

Conference_Location

Pisa

Print_ISBN

978-1-4244-3857-0

Electronic_ISBN

978-1-4244-3856-3

Type

conf

DOI

10.1109/PS.2009.5307816

Filename

5307816