DocumentCode :
2237617
Title :
Fabrication and modal analysis of ion-implanted LiNbO3 ridge optical waveguide for integrated Erbium-doped amplifiers
Author :
Malacarne, A. ; Sher, S.M. ; Montanari, G.B. ; Sugliani, S. ; Porzi, C. ; Potì, L.
Author_Institution :
Scuola Superiore Sant´´ Anna, Pisa, Italy
fYear :
2009
fDate :
15-19 Sept. 2009
Firstpage :
1
Lastpage :
2
Abstract :
The technological process, based on ion implantation and selective etching, for producing ridge waveguides on Lithium Niobate substrates is described and successfully applied. The parameters of the fabricated samples are used in a comprehensive FEM-based modal analysis of an Erbium-doped Lithium Niobate ridge waveguide. Simulation results support the concept of strong mode confinement at pump wavelength (980 nm) and single mode operation at signal (1550 nm) wavelength.
Keywords :
erbium; etching; finite element analysis; ion implantation; lithium compounds; modal analysis; optical fabrication; optical pumping; optical waveguides; refractive index; ridge waveguides; FEM; LiNbO3:Er; finite element method; ion implantation; modal analysis; mode confinement; refractive index; ridge optical waveguide; selective etching; wavelength 1550 nm; wavelength 980 nm; Etching; Fabrication; Modal analysis; Nonlinear optics; Optical pumping; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Refractive index; Er-Doped; Lithium Niobate; Optical waveguide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics in Switching, 2009. PS '09. International Conference on
Conference_Location :
Pisa
Print_ISBN :
978-1-4244-3857-0
Electronic_ISBN :
978-1-4244-3856-3
Type :
conf
DOI :
10.1109/PS.2009.5307816
Filename :
5307816
Link To Document :
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