DocumentCode :
2237696
Title :
Scaling behavior of PCM cells in off-state conduction
Author :
Chen, J. ; Jeyasingh, R.G.D. ; Gao, B. ; Lu, Y. ; Deng, Y.X. ; Liu, X.Y. ; Kang, J.F. ; Wong, H. -S Philip
Author_Institution :
Shenzhen Grad. Sch., Peking Univ., Shenzhen, China
fYear :
2012
fDate :
23-25 April 2012
Firstpage :
1
Lastpage :
2
Abstract :
A novel phase change memory (PCM) cell with Additional Top Electrode (ATE) is introduced to investigate the scaling behavior of the off-state with the dimension of amorphous state region. The electrical conduction in ultra-thin amorphous state layer is investigated. The trap spacing is one of the key parameters that govern the conduction mechanism and threshold voltage in the sub-threshold region which can be extracted by measuring the change in the activation energy of conduction with respect to the applied voltage. The linear dependence of the trap spacing on the dimension of amorphous state region is demonstrated, which could provide guidelines for designing ultra-thin film based PCM device.
Keywords :
phase change memories; ATE; PCM cells; additional top electrode; amorphous state region; electrical conduction; off-state conduction; phase change memory cell; trap spacing; ultra-thin amorphous state layer; ultra-thin film; Current measurement; Electron traps; Phase change materials; Temperature measurement; Thickness measurement; Threshold voltage; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications (VLSI-TSA), 2012 International Symposium on
Conference_Location :
Hsinchu
ISSN :
1930-8868
Print_ISBN :
978-1-4577-2083-3
Type :
conf
DOI :
10.1109/VLSI-TSA.2012.6210123
Filename :
6210123
Link To Document :
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