• DocumentCode
    2238112
  • Title

    4.5 kV novel high voltage high performance SiC-FET “SIAFET”

  • Author

    Sugawara, Y. ; Asano, K. ; Singh, R. ; Palmour, J. ; Takayama, D.

  • Author_Institution
    Tech. Res. Center, Kansai Electr. Power Co. Inc., Amagasaki, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    105
  • Lastpage
    108
  • Abstract
    A novel high voltage SiC MOS device named SIAFET (Static induction Injected Accumulated FET) is proposed, which has no pn junction in its on-current flow path and has a conductivity modulation by carriers injected from a p+ buried gate. SIAFET with blocking voltage (BV) of 5500 V and specific on-resistance RonS (without the conductivity modulation) of 57 mΩcm2 was designed by using the 6200 V mesa JTE and was fabricated using 4H-SiC substrates. Its basic operation has been confirmed for the first time and it has been demonstrated that its RonS has been shown to reduce to less than 1/6 by SIAFET action. Although its achieved BV is relatively low (2030 V and 4580 V) and its RonS is relatively high (172 mΩcm2 and 387 mΩcm2), RonS of 4580 V SiC-SIAFET is less than 1/25 that of the theoretical RonS limit of Si-MOSFET for this BV
  • Keywords
    power MOSFET; silicon compounds; wide band gap semiconductors; 4.5 kV; 5500 V; MOSFET; SiC; Static induction Injected Accumulated FET; blocking voltage; carriers injection; conductivity modulation; high voltage high performance SiC-FET; on-current flow path; p+ buried gate; specific on-resistance; Conductivity; FETs; Fabrication; Joining processes; MOS devices; Power semiconductor devices; Silicon carbide; Substrates; TV; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
  • Conference_Location
    Toulouse
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-6269-1
  • Type

    conf

  • DOI
    10.1109/ISPSD.2000.856783
  • Filename
    856783