DocumentCode :
2238210
Title :
A new degree of freedom in diode optimization: arbitrary axial lifetime profiles by means of ion irradiation
Author :
Hazdra, P. ; Vobecký, J. ; Galster, N. ; Humbel, O. ; Dalibor, T.
Author_Institution :
ABB Semicond. AG, Lenzburg, Switzerland
fYear :
2000
fDate :
2000
Firstpage :
123
Lastpage :
126
Abstract :
A novel approach to lifetime control in fast recovery power diodes, arbitrary axial lifetime profiles by single-step ion irradiation, is presented. The principle is based on irradiation through a single mask which is inserted between the ion source and the device. The density and lateral/axial structures of the mask determine the final lifetime profile. Experimental results show that this new technique is fully capable to replace multiple single-energy ion irradiations and to guarantee superior diode performance
Keywords :
carrier lifetime; ion beam effects; power semiconductor diodes; axial lifetime profiles; diode optimization; diode performance; fast recovery power diodes; ion irradiation; lateral/axial structures; lifetime control; Anodes; Charge carriers; Current density; Diodes; Ion sources; Low voltage; Power electronics; Space charge; Switching circuits; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
Conference_Location :
Toulouse
ISSN :
1063-6854
Print_ISBN :
0-7803-6269-1
Type :
conf
DOI :
10.1109/ISPSD.2000.856787
Filename :
856787
Link To Document :
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