Title :
Cost of Ownership Benefits Using Multiply Charged Ion Implants on Conventional Medium and High Current Implanters
Author :
Steeples, Kenneth ; Tai, Gus ; Fess, Daniel ; Fletcher, David
Author_Institution :
Digital Equipment Corporation, Hudson, Massachusetts
Keywords :
CMOS process; Contamination; Costs; Electronic equipment manufacture; Implants; Manufacturing processes; Microprocessors; Power engineering and energy; Production facilities; Semiconductor device manufacture;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
DOI :
10.1109/ASMC.1993.682518
