• DocumentCode
    2238443
  • Title

    Cost of Ownership Benefits Using Multiply Charged Ion Implants on Conventional Medium and High Current Implanters

  • Author

    Steeples, Kenneth ; Tai, Gus ; Fess, Daniel ; Fletcher, David

  • Author_Institution
    Digital Equipment Corporation, Hudson, Massachusetts
  • fYear
    1993
  • fDate
    18-19 Oct 1993
  • Firstpage
    223
  • Lastpage
    228
  • Keywords
    CMOS process; Contamination; Costs; Electronic equipment manufacture; Implants; Manufacturing processes; Microprocessors; Power engineering and energy; Production facilities; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
  • Type

    conf

  • DOI
    10.1109/ASMC.1993.682518
  • Filename
    682518
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2238443