Title :
Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography
Author :
Palmer, R. ; Alloatti, L. ; Korn, D. ; Moosmann, M. ; Huska, K. ; Lemmer, U. ; Gerthsen, D. ; Schimmel, Th ; Freude, W. ; Koos, C. ; Leuthold, J.
Author_Institution :
Karlsruhe Inst. of Technol. (KIT), Karlsruhe, Germany
Abstract :
We demonstrate that nanowire waveguides with nanoscale precision and ultra-smooth sidewalls can be fabricated with conventional optical lithography. The presented fabrication scheme exploits the combination of a special staggered lithographic design and preferential wet etching.
Keywords :
elemental semiconductors; nanofabrication; nanowires; photolithography; silicon; Si; conventional optical lithography; nanoscale precision; nanowire waveguides; preferential wet etching; staggered lithographic design; ultra-precise silicon nanowires; ultra-smooth sidewalls; Etching; Fabrication; Lithography; Optical waveguides; Photonics; Silicon; Strips;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4577-1223-4
