DocumentCode :
2238664
Title :
Analytical optimization of the Plasma Clean Cycle for a Nitride PECVD System as evaluated by Cost of Ownership
Author :
Langan, John ; Lynn, Sui Yuan ; Huling, Bruce ; Morgan, Russ ; Anderson, Bob ; Behnke, John ; Berman, Michael ; Kobessi, Hassan
Author_Institution :
Air Products and Chemicals, Inc.
fYear :
1993
fDate :
18-19 Oct 1993
Firstpage :
229
Lastpage :
231
Keywords :
Cost function; Mass spectroscopy; Noise measurement; Optimization methods; Plasma applications; Plasma chemistry; Plasma devices; Plasma measurements; Throughput; US Department of Energy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI
Type :
conf
DOI :
10.1109/ASMC.1993.682519
Filename :
682519
Link To Document :
بازگشت