Title :
Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing
Author :
Yatsui, T. ; Nomura, W. ; Ohtsu, M. ; Hirata, K. ; Tabata, Y.
Author_Institution :
SORST, Japan Sci. & Technol. Agency, Tokyo
Abstract :
We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, R a, and the dispersion of R a.
Keywords :
nanotechnology; photochemistry; polishing; silicon compounds; surface roughness; SiO2; average surface roughness; dispersion; nanophotonic polishing; nonadiabatic photochemical reaction; ultraflat silica surface; Absorption; Atom optics; Dispersion; Etching; Optical surface waves; Photochemistry; Rough surfaces; Silicon compounds; Surface emitting lasers; Surface roughness; (220.5450) Polishing; (350.5130) Photochemistry;
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
