Title :
Extreme ultraviolet interferometric lithography with a desk-top system
Author :
Wachulak, P.W. ; Marconi, M.C. ; Rockward, W. ; Hill, D. ; Anderson, E.H. ; Menoni, C.S. ; Rocca, J.J.
Author_Institution :
NSF Eng. Res. Center for Extreme Ultraviolet Sci. & Technol., Colorado State Univ., Fort Collins, CO
Abstract :
We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.
Keywords :
Mach-Zehnder interferometers; laser materials processing; light interferometry; nanolithography; nanostructured materials; optical fabrication; ultraviolet lithography; ultraviolet sources; amplitude division interferometer; extreme ultraviolet interferometric lithography; high brightness desk top EUV laser illumination; nanoscale periodic features; size 100 nm; Interference; Interferometric lithography; Laser beams; Lighting; Nanobioscience; Optical arrays; Optical interferometry; Resists; Semiconductor laser arrays; Ultraviolet sources; 220.3740 (Lithography); 220.4241 (Nanostructure fabrication); 340.7480 (X-rays, soft x-rays, extreme ultraviolet (EUV));
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
