Extreme ultraviolet interferometric lithography with a desk-top system

Author

Wachulak, P.W. ; Marconi, M.C. ; Rockward, W. ; Hill, D. ; Anderson, E.H. ; Menoni, C.S. ; Rocca, J.J.

Author_Institution

NSF Eng. Res. Center for Extreme Ultraviolet Sci. & Technol., Colorado State Univ., Fort Collins, CO

fYear

2008

fDate

4-9 May 2008

Firstpage

1

Lastpage

2

Abstract

We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.

Keywords

Mach-Zehnder interferometers; laser materials processing; light interferometry; nanolithography; nanostructured materials; optical fabrication; ultraviolet lithography; ultraviolet sources; amplitude division interferometer; extreme ultraviolet interferometric lithography; high brightness desk top EUV laser illumination; nanoscale periodic features; size 100 nm; Interference; Interferometric lithography; Laser beams; Lighting; Nanobioscience; Optical arrays; Optical interferometry; Resists; Semiconductor laser arrays; Ultraviolet sources; 220.3740 (Lithography); 220.4241 (Nanostructure fabrication); 340.7480 (X-rays, soft x-rays, extreme ultraviolet (EUV));

fLanguage

English

Publisher

iet

Conference_Titel

Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on

Conference_Location

San Jose, CA

Print_ISBN

978-1-55752-859-9

Type

conf

Filename

4571562