• DocumentCode
    2239237
  • Title

    Carrier lifetime characterization using an optimized free carrier absorption technique

  • Author

    Hille, Frank ; Hoffmann, Ludwig ; Schulze, Hans-Joachim ; Wachutka, Gerhard

  • Author_Institution
    Inst. for Phys. & Electrotechnol., Tech. Univ. Munchen, Germany
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    299
  • Lastpage
    302
  • Abstract
    We investigated the correlation of the high-level lifetime of platinum-diffused power diodes with the platinum diffusion temperature, varying over a range of 40 K, and the operating temperature, varying from 223 K to 398 K. The high-level lifetime has been extracted from carrier profiles determined by an optimized free carrier absorption technique, assuming a homogeneous lifetime over the base region. We find an exponential dependence of the high-level lifetime on the operating temperature and no dependence of the injection levels under investigation. Therefore, the recombination processes can be properly described by using the Shockley-Read-Hall model in the electrothermal device simulation. The mean high-level-lifetime for a calibrated device simulation is only 20% lower than the experimentally determined one. The simulated carrier distributions are in very good agreement with the experiment if a weak lifetime gradient in the base region is assumed
  • Keywords
    carrier lifetime; electron-hole recombination; power semiconductor diodes; semiconductor device measurement; 223 to 398 K; Shockley-Read-Hall model; Si:Pt; carrier distribution; carrier lifetime measurement; electrothermal device simulation; free carrier absorption; platinum diffusion; power diode; recombination process; Absorption; Charge carrier lifetime; Electrothermal effects; Measurement errors; P-i-n diodes; Physics; Platinum; Spatial resolution; Temperature dependence; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2000. Proceedings. The 12th International Symposium on
  • Conference_Location
    Toulouse
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-6269-1
  • Type

    conf

  • DOI
    10.1109/ISPSD.2000.856830
  • Filename
    856830