• DocumentCode
    2239790
  • Title

    Digital resonance tuning of high-Q/Vm silicon photonic crystal nanocavities by atomic layer deposition

  • Author

    Chen, Charlton J. ; Yang, Xiaodong ; Husko, Chad A. ; Wong, Chee Wei

  • Author_Institution
    Opt. Nanostruct. Lab., Columbia Univ., New York, NY
  • fYear
    2008
  • fDate
    4-9 May 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We propose and demonstrate the digital resonance tuning of high-Q/Vm silicon photonic crystal nanocavities using self-limiting atomic layer deposition. Control of resonances of 122 plusmn 18 pm per hafnium oxide atomic layer is achieved.
  • Keywords
    atomic layer deposition; hafnium compounds; microcavities; photonic crystals; HfO2; digital resonance tuning; resonance control; self-limiting atomic layer deposition; silicon photonic crystal nanocavity; Atom optics; Atomic layer deposition; Hafnium oxide; Optical bistability; Optical resonators; Photonic crystals; Resonance; Silicon; Tuning; Virtual manufacturing; (230.5298) Photonic crystals; (230.5750) Resonators; (350.4238) Nanophotonics and photonic crystals;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-859-9
  • Type

    conf

  • Filename
    4571609
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2239790