Title :
Best practices to ensure the stability of sige HBT cascode low noise amplifiers
Author :
Schmid, Robert L. ; Coen, Christopher T. ; Shankar, Subramaniam ; Cressler, John D.
Author_Institution :
Sch. of Electr. & Comput. Eng., N.W. Georgia Inst. of Technol., Atlanta, GA, USA
fDate :
Sept. 30 2012-Oct. 3 2012
Abstract :
This work provides a detailed examination of the stability of SiGe cascode low noise amplifiers (LNAs). The upper base is identified as a problematic node for stability. S-probe simulations are used to extract reflection coefficients internal to the circuit and provide insight on how to improve the stability of a cascode amplifier and thereby establish “best practices” for designers. These techniques are incorporated into a cascode LNA design fabricated on a 180 nm, 150 GHz fT SiGe BiCMOS technology. The measured SiGe LNA has a gain of 16.5 dB and a noise figure of 2.1 dB at a center frequency of 9.2 GHz. A series of measurements using tuners at both the input and output confirm the LNA is stable for all impedances covered by the tuners (|Γ| <; 0.8).
Keywords :
BiCMOS analogue integrated circuits; Ge-Si alloys; field effect MIMIC; heterojunction bipolar transistors; low noise amplifiers; millimetre wave amplifiers; millimetre wave bipolar transistors; BiCMOS technology; HBT cascode low noise amplifier stability; S-probe simulations; SiGe; cascode LNA design; frequency 150 GHz; frequency 9.2 GHz; gain 16.5 dB; noise figure 2.1 dB; reflection coefficient extraction; size 180 nm; upper base; Circuit stability; Noise; Silicon germanium; Stability analysis; Thermal stability; Transistors; LNA; SiGe HBT; Stability; low-noise amplifier; silicongermanium; stability analysis;
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2012 IEEE
Conference_Location :
Portland, OR
Print_ISBN :
978-1-4673-3020-6
DOI :
10.1109/BCTM.2012.6352657