• DocumentCode
    2239878
  • Title

    Double-layered monolithic silicon photonic crystals

  • Author

    Mallick, Shrestha Basu ; Kim, Sora ; Hadzialic, Sanja ; Sudbo, Aasmund ; Solgaard, Olav

  • Author_Institution
    Dept. of Appl. Phys., Stanford Univ., Stanford, CA
  • fYear
    2008
  • fDate
    4-9 May 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Double-layered, self-aligned, silicon photonic crystals are fabricated using directional and isotropic etches - a potential step towards 3D PCs. One structure shows sharper resonances compared to corresponding single layer structure. Another shows high, broadband reflectivity.
  • Keywords
    elemental semiconductors; etching; materials preparation; photonic crystals; reflectivity; silicon; 3D photonic crystals; Si; broadband reflectivity; monolithic silicon photonic crystals; Anisotropic magnetoresistance; Etching; Fabrication; Oxidation; Personal communication networks; Photonic crystals; Protection; Reflectivity; Resonance; Silicon; 050.6875 Three-dimensional fabrication; 230.5298 Photonic crystals;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-859-9
  • Type

    conf

  • Filename
    4571614
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2239878