DocumentCode :
2240757
Title :
Multilevel interconnection technologies and future requirements for logic applications
Author :
Brillouet, M.
Author_Institution :
CNET, Crolles, France
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
36
Lastpage :
39
Abstract :
As the density of integration of logic functions increases, the performance and cost of the logic ICs is more and more dominated by the interconnection system. While the semiconductor industry was able to stay for a long time with the classical Al/Si0/sub 2/ system, there is a growing trend to move to new interconnect materials.
Keywords :
integrated circuit interconnections; integrated circuit reliability; logic arrays; technological forecasting; interconnect materials; interconnection system; logic ICs; logic applications; multilevel interconnection technologies; semiconductor industry; Atherosclerosis; Capacitance; Dielectric constant; Dielectric materials; Logic; Materials reliability; Plugs; Power system interconnection; Power system reliability; Thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1997.621050
Filename :
621050
Link To Document :
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