• DocumentCode
    2242880
  • Title

    Design of anisotropic reflector with birefringent thin films for use at normal incidence

  • Author

    Sobahan, K.M.A. ; Park, Yong Jun ; Hwangbo, Chang Kwon

  • Author_Institution
    Dept. of Phys., Inha Univ., Incheon
  • fYear
    2007
  • fDate
    26-31 Aug. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In this paper, a design of anisotropic reflector with dielectric birefringent thin films for use with light at normal incident is presented. This reflector is assumed to be consisting of a stack of quarter-wave biaxial layers at design wavelength. The biaxial layers can be fabricated by oblique angle deposition technique. This designed is performed on glass substrate with TiO2 and SiO2.
  • Keywords
    birefringence; dielectric thin films; light reflection; optical design techniques; optical films; optical glass; silicon compounds; titanium compounds; SiO2; TiO2; anisotropic reflector; dielectric birefringent thin films; glass substrate; normal incidence; oblique angle deposition technique; quarter-wave biaxial layers; Anisotropic magnetoresistance; Birefringence; Coatings; Dielectric thin films; Optical films; Optical polarization; Optical refraction; Optical retarders; Sputtering; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-1173-3
  • Electronic_ISBN
    978-1-4244-1174-0
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2007.4391341
  • Filename
    4391341