DocumentCode
2242939
Title
Enhanced light emission from InP substrate with nanoholes
Author
Jung, Mi ; Lee, Seok ; Byun, Young Tae ; Jhon, Young Min ; Kim, Sun Ho ; Mho, Sun-il ; Woo, Deok Ha
Author_Institution
Div. of Intell. Syst. Res.., Korea Inst. of Sci. & Technol., Seoul
fYear
2007
fDate
26-31 Aug. 2007
Firstpage
1
Lastpage
2
Abstract
We observed a significant enhancement in the light output from nanoholes on InP substrate covered with nanoporous alumina mask. The substrate was exposed in ambient gases by inductively coupled plasma reactive ion etching. Photoluminescence (PL) spectra of the substrate with alumina mask showed 4 times enhanced signal compared with that of a raw InP substrate.
Keywords
III-V semiconductors; alumina; indium compounds; masks; nanostructured materials; photoluminescence; sputter etching; substrates; Al2O3; InP; inductively coupled plasma reactive ion etching; light emission; light output enhancement; nanoholes; nanoporous alumina mask; photoluminescence spectra; substrate; Etching; Gases; Indium phosphide; Nanoporous materials; Nanoscale devices; Photoluminescence; Plasma applications; Plasma temperature; Semiconductor materials; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location
Seoul
Print_ISBN
978-1-4244-1173-3
Electronic_ISBN
978-1-4244-1174-0
Type
conf
DOI
10.1109/CLEOPR.2007.4391343
Filename
4391343
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