Displacement and strain field measurements for nanotechnology applications

Author

Vogel, Dietmar ; Keller, Jürgen ; Gollhardt, Astrid ; Michel, Bemd

Author_Institution

Fraunhofer-Inst. fur Mikrostrukturtechnik, Berlin, Germany

fYear

2002

fDate

2002

Firstpage

37

Lastpage

40

Abstract

The paper introduces a measurement method, which allows one to determine the incremental displacement and strain fields from Scanning Force Micrographs of different object states. Local cross correlation algorithms form the basis of the displacement computation. Capabilities and presumptions of the new method are discussed. Application features are demonstrated by the example of microcrack evaluation. Prospects for particle motion tracking by the tool are considered.

Keywords

atomic force microscopy; crack detection; displacement measurement; microcracks; nanotechnology; strain measurement; displacement; displacement computation; incremental displacement; local cross correlation algorithms; measurement method; microcrack evaluation; nanotechnology applications; object states; particle motion tracking; scanning force micrographs; strain field measurements; Displacement measurement; Force measurement; Kinematics; Nanotechnology; Optical imaging; Optical microscopy; Scanning electron microscopy; Size measurement; Stability; Strain measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2002. IEEE-NANO 2002. Proceedings of the 2002 2nd IEEE Conference on

Print_ISBN

0-7803-7538-6

Type

conf

DOI

10.1109/NANO.2002.1032118

Filename

1032118