Failure analysis requirements for nanoelectronics

Failure analysis (FA) plays a vital role in the development and manufacture of integrated circuits (ICs). But instrumental limits are already threatening FA in the tenth-micron CMOS realm, and nanoelectronic scale devices will find key analytical tools two orders of magnitude removed in capability. This paper will introduce state of the art microelectronic failure analysis processes, instrumentation, and principles. It will discuss the major limitations and future prospects projected using industry roadmaps. Specifically highlighted is the need for fault isolation methodology for failure analysis of fully integrated nanoelectronics devices.