• DocumentCode
    2244276
  • Title

    Mask pattern recording of reflection type photopolymer using total internal reflection

  • Author

    Jeong, Hyeon-Seop ; Kim, Nam ; Park, Mi-Ran ; Shin, Chang-Won

  • Author_Institution
    Dept. of Comput. & Commun. Eng., Chungbuk Nat´´l Univ., Chungbuk
  • fYear
    2007
  • fDate
    26-31 Aug. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In this paper, recording and reconstruction of micro-pattern using total internal reflection hologram applied in reflection type photopolymer are studied. The line and point patterns with the interval of 1 mum are recorded successfully and can be observed when the micro objective lenses with 100 time magnification are used.
  • Keywords
    holographic optical elements; holographic storage; lenses; optical polymers; hologram; mask pattern recording; micro objective lenses; photopolymer; total internal reflection; Holographic optical components; Holography; Lenses; Memory; Optical recording; Optical reflection; Optical refraction; Optical variables control; Polymer films; Refractive index;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-1173-3
  • Electronic_ISBN
    978-1-4244-1174-0
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2007.4391403
  • Filename
    4391403
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2244276