Title :
Mask pattern recording of reflection type photopolymer using total internal reflection
Author :
Jeong, Hyeon-Seop ; Kim, Nam ; Park, Mi-Ran ; Shin, Chang-Won
Author_Institution :
Dept. of Comput. & Commun. Eng., Chungbuk Nat´´l Univ., Chungbuk
Abstract :
In this paper, recording and reconstruction of micro-pattern using total internal reflection hologram applied in reflection type photopolymer are studied. The line and point patterns with the interval of 1 mum are recorded successfully and can be observed when the micro objective lenses with 100 time magnification are used.
Keywords :
holographic optical elements; holographic storage; lenses; optical polymers; hologram; mask pattern recording; micro objective lenses; photopolymer; total internal reflection; Holographic optical components; Holography; Lenses; Memory; Optical recording; Optical reflection; Optical refraction; Optical variables control; Polymer films; Refractive index;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391403
