• DocumentCode
    2244373
  • Title

    Advanced materials for interconnections of the future-need and strategy

  • Author

    Murarka, S.P.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Troy, NY, USA
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    93
  • Abstract
    Summary form only given. Semiconductor electronics and driven by the continued miniaturization of devices and circuits leading to enhanced performance and lower cost per bit. Minimum feature sizes of /spl les/0.07 /spl mu/m in the year 2007-2010 time frame are predicted with devices operating in gigahertz range. This trend has placed stringent demands on metal-interconnection schemes, which if not met will stymie performance of the circuits. This talk will review the needs, the cause, and possible materials solutions to meet the challenges. As it appears, convential materials, even the new materials for electronics interconnections, may not meet these challenges. New strategies will be discussed including certain paradigm shifts in our thinking of using high performance devices/circuits.
  • Keywords
    integrated circuit interconnections; technological forecasting; 0.07 micron; future developments; metal interconnection materials; semiconductor electronics; Costs; Inorganic materials; Integrated circuit interconnections; Integrated circuit technology; Lead compounds; Materials science and technology; Metallization; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1997.621071
  • Filename
    621071