DocumentCode
2244373
Title
Advanced materials for interconnections of the future-need and strategy
Author
Murarka, S.P.
Author_Institution
Dept. of Mater. Sci. & Eng., Troy, NY, USA
fYear
1997
fDate
16-19 March 1997
Firstpage
93
Abstract
Summary form only given. Semiconductor electronics and driven by the continued miniaturization of devices and circuits leading to enhanced performance and lower cost per bit. Minimum feature sizes of /spl les/0.07 /spl mu/m in the year 2007-2010 time frame are predicted with devices operating in gigahertz range. This trend has placed stringent demands on metal-interconnection schemes, which if not met will stymie performance of the circuits. This talk will review the needs, the cause, and possible materials solutions to meet the challenges. As it appears, convential materials, even the new materials for electronics interconnections, may not meet these challenges. New strategies will be discussed including certain paradigm shifts in our thinking of using high performance devices/circuits.
Keywords
integrated circuit interconnections; technological forecasting; 0.07 micron; future developments; metal interconnection materials; semiconductor electronics; Costs; Inorganic materials; Integrated circuit interconnections; Integrated circuit technology; Lead compounds; Materials science and technology; Metallization; Semiconductor materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location
Villard de Lans, France
ISSN
1266-0167
Type
conf
DOI
10.1109/MAM.1997.621071
Filename
621071
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