Title :
EUV light source by high power laser
Author :
Izawa, Y. ; Nishihara, K. ; Nishimura, H. ; Fujioka, S. ; Aota, T. ; Shimada, Y. ; Yamaura, M. ; Fujiwara, E. ; Sunahara, A. ; Murakami, M. ; Nagai, K. ; Norimatsu, T. ; Sasaki, A. ; Tanuma, H. ; Miyanaga, N. ; Mima, K.
Author_Institution :
Inst. of Laser Eng., Osaka Univ., Osaka
Abstract :
In the development of an efficient, clean and high power EUV source, it is important to understand basic physics of EUV plasma and to optimize laser and target conditions. Our program aims at constructing database on EUV radiation from the laser-produced plasma by the theoretical and experimental studies, and providing technical guidelines for the practical EUV source used in the EUV lithography system. Recent progresses of our program will be presented.
Keywords :
plasma light propagation; plasma production by laser; ultraviolet lithography; ultraviolet sources; EUV light source; EUV lithography; EUV plasma; high power laser; laser-produced plasma; Laser theory; Light sources; Plasma density; Plasma measurements; Plasma sources; Plasma temperature; Plasma waves; Power lasers; Tin; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391453
