• DocumentCode
    2245802
  • Title

    Application of HF solutions for the cleaning of TiSi2 surface

  • Author

    Baklanov, M.R. ; Vanhaelemeersch, S. ; Maex, K.

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    110
  • Lastpage
    112
  • Abstract
    HF-based solutions are widely used in microelectronics for surface cleaning. For example these solutions are very effective for the removal of SiO/sub 2/ formed during storage in air and for the passivation of a silicon surface. These solutions are also used for the final cleaning of TiSi/sub 2/ after the formation of contact holes in SiO/sub 2/. Nevertheless, the influence of HF solutions on the TiSi/sub 2/ properties and contact resistance with metal has not been studied. This work is devoted to the study of the influence of HF solutions on TiSi/sub 2/ properties.
  • Keywords
    contact resistance; integrated circuit metallisation; surface cleaning; titanium compounds; HF; HF solutions; SiO/sub 2/; SiO/sub 2/ removal; TiSi/sub 2/; TiSi/sub 2/ properties; TiSi/sub 2/ surface; contact resistance; microelectronics; surface cleaning; Contact resistance; Electrical resistance measurement; Etching; Hafnium; Inorganic materials; Metallization; Optical films; Silicides; Surface cleaning; Surface resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1997.621077
  • Filename
    621077
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2245802