Title :
Application of HF solutions for the cleaning of TiSi2 surface
Author :
Baklanov, M.R. ; Vanhaelemeersch, S. ; Maex, K.
Author_Institution :
IMEC, Leuven, Belgium
Abstract :
HF-based solutions are widely used in microelectronics for surface cleaning. For example these solutions are very effective for the removal of SiO/sub 2/ formed during storage in air and for the passivation of a silicon surface. These solutions are also used for the final cleaning of TiSi/sub 2/ after the formation of contact holes in SiO/sub 2/. Nevertheless, the influence of HF solutions on the TiSi/sub 2/ properties and contact resistance with metal has not been studied. This work is devoted to the study of the influence of HF solutions on TiSi/sub 2/ properties.
Keywords :
contact resistance; integrated circuit metallisation; surface cleaning; titanium compounds; HF; HF solutions; SiO/sub 2/; SiO/sub 2/ removal; TiSi/sub 2/; TiSi/sub 2/ properties; TiSi/sub 2/ surface; contact resistance; microelectronics; surface cleaning; Contact resistance; Electrical resistance measurement; Etching; Hafnium; Inorganic materials; Metallization; Optical films; Silicides; Surface cleaning; Surface resistance;
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
DOI :
10.1109/MAM.1997.621077
