DocumentCode :
2246012
Title :
Narrow-width SOI devices the role of quantum mechanical space-quantization effects on device performance
Author :
Ahmed, Shaikh S. ; Vasileska, Dragica
Author_Institution :
Dept. of Electr. Eng., Arizona State Univ., Tempe, AZ, USA
fYear :
2002
fDate :
2002
Firstpage :
243
Lastpage :
246
Abstract :
We investigate the role of quantum mechanical space-quantization effects on the operation of a narrow-width SOI device structure. The presence of a two-dimensional carrier confinement gives rise to larger average displacement of the carriers from the interface proper and lower sheet electron density in the channel region. This, in turn, results not only in a significant increase in the threshold voltage but also in pronounced channel width dependency of the drain current. In this work, we have used classical 3D Monte Carlo particle-based simulations. Quantum mechanical space-quantization effects have been accounted for via an effective potential scheme that has been quite successful in describing bandgap widening effect and charge set back from the interface.
Keywords :
MOSFET; Monte Carlo methods; electron density; energy gap; semiconductor device models; silicon-on-insulator; MOSFET; Si-SiO2; bandgap widening effect; channel width dependence; charge set back; classical 3D Monte Carlo particle-based simulations; device performance; drain current; effective potential scheme; narrow-width SOI devices; quantum mechanical space-quantization effects; sheet electron density; threshold voltage; two-dimensional carrier confinement; CMOS process; CMOS technology; Carrier confinement; Degradation; Fabrication; Leakage current; MOSFET circuits; Silicon on insulator technology; Solid state circuits; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2002. IEEE-NANO 2002. Proceedings of the 2002 2nd IEEE Conference on
Print_ISBN :
0-7803-7538-6
Type :
conf
DOI :
10.1109/NANO.2002.1032238
Filename :
1032238
Link To Document :
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