DocumentCode :
2247629
Title :
Rigorous modeling of scattered light in EUV cameras
Author :
Krautschik, C. ; Ito, M. ; Nishiyama, I.
Author_Institution :
Assoc. of Super Adv. Electron. Technol., NTT Telecommun. Res. Center, Kanagawa, Japan
fYear :
2001
fDate :
Oct. 31 2001-Nov. 2 2001
Firstpage :
14
Abstract :
Summary form only given. In this paper we make use of both a fitted Power Spectral Density (PSD) function for an EUV system based on earlier published results and also an empirically derived PSD function over the spatial frequencies range from 5E-8 to 0. 1 (1/nm). From the radially symmetric PSD response a flare Point Spread Function (PSF/sub flare/) is constructed from which the impact on the aerial image can be directly computed through a convolution operation on the ideal aerial image without flare. It is shown that if the system PSD is stationary and the "chrome density" is uniform, the flare variation is essentially constant over the static exposure field except for distances several hundred microns from the edge of the exposure field. The main impact of flare is then a loss of overall aerial image contrast that can be significant, e.g. greatly exceeding 15% depending on mirror quality. The variation in critical dimension (CD) as a result of localized "chrome density" variation can be computed. We show that, through an iterative process, critical dimensions on the mask can be resized in a similar way to Optical Proximity Correction (OPC) to minimize the effects of flare on CD control.
Keywords :
cameras; convolution; image resolution; light scattering; mirrors; semiconductor process modelling; size control; surface topography; ultraviolet lithography; 13.4 nm; CD control; EUV cameras; Fourier transform; aerial image; aerial image contrast; convolution operation; critical dimensions; flare; flare point spread function; flare variation; iterative process; lithographic exposure tool; localized chrome density variations; localized dose variations; mask area; multilayer coating; optical proximity correction; power spectral density function; projection optics mirrors; rigorous modeling; scattered light; spatial frequency response; surface roughness; Cameras; Frequency; Light scattering; Mirrors; Optical attenuators; Optical scattering; Optical surface waves; Rough surfaces; Surface roughness; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
Type :
conf
DOI :
10.1109/IMNC.2001.984038
Filename :
984038
Link To Document :
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