DocumentCode
2248059
Title
Development of low energy e-beam proximity projection lithography: LEEPL
Author
Shimazu, N.
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
38
Lastpage
39
Abstract
LEEPL (Low Energy Electron Beam Proximity Projection Lithography) is proposed as a solution to the current cost issues in the semiconductor industry. Thanks to a simple tool configuration and small mask pattern area, LEEPL promises both tools and masks to be low cost. The author deals with mask issues, describes the proof of concept and the next step, and discusses the formation of an LEEPL consortium.
Keywords
electron beam lithography; integrated circuit economics; masks; LEEPL consortium; cost issues; low energy electron beam proximity projection lithography; mask pattern area; proof of concept; semiconductor industry; tool configuration; Costs; Electronics industry; Fabrication; Home appliances; Lithography; Marketing and sales; Optical fiber communication; Pain; Production; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984057
Filename
984057
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