Title :
Laterally varying porous silicon optical tunable filter fabricated using a tapered etch mask pattern
Author :
Hwang, Kyungwook ; Kim, Sihan ; Park, Yeonsang ; Jeon, Heonsu
Author_Institution :
Dept. of Phys. & Astron., Seoul Nat. Univ., Seoul
Abstract :
We fabricated a laterally varying porous silicon (pSi) Fabry-Perot tunable filter by employing the spatially graded pSi etch technique through a tapered etch mask pattern. Reflectance measurements revealed that the tuning range can be made as wide as ~100 nm while the typical transmission bandwidth is ~3 nm in the 1550 nm wavelength range.
Keywords :
elemental semiconductors; etching; integrated optoelectronics; light transmission; optical fabrication; optical filters; optical tuning; porous semiconductors; reflectivity; silicon; Fabry-Perot tunable filter; Si; porous silicon optical tunable filter; reflectance measurements; spatially graded etch technique; tapered etch mask pattern; transmission bandwidth; Etching; Extraterrestrial measurements; Optical filters; Optical refraction; Optical variables control; Physics; Reflectivity; Resonance; Silicon; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391589
