DocumentCode
2248927
Title
A novel fabrication method of embedded micro channels employing simple UV dosage control and antireflection coating
Author
Tseng, F.G. ; Chuang, Y.J. ; Lin, W.K.
Author_Institution
Eng. & Syst. Sci. Dept, Nat. Tsing Hua Univ., Taiwan
fYear
2002
fDate
24-24 Jan. 2002
Firstpage
69
Lastpage
72
Abstract
This paper proposes a novel method to fabricate multi-layers of embedded micro fluidic structures by simply employing time-controlled UV exposure on thick SU-8 resist and an anti-reflection coating on the bottom surface to eliminate the reflection light induced exposure. Test results show that the top wall thickness of embedded channels can be well controlled to a resolution of 2 /spl mu/m for a UV dose of 120-190 mJ/cm/sup 2/. Stacked channels have also been successfully fabricated and show no interference on the bottom structures when exposing the top structures. This simple and inexpensive method can be applied to fabricate multi-layers of complex fluidic systems, for applications such as /spl mu/TAS, inkjet printheads, capillary electrophoresis, and micro PCR.
Keywords
antireflection coatings; microfluidics; ultraviolet lithography; /spl mu/TAS; UV dosage control; antireflection coating; capillary electrophoresis; complex fluidic systems; embedded channel top wall thickness; embedded micro channel fabrication; embedded micro fluidic structures; inkjet printhead; micro PCR; multi-layer fabrication; reflection light induced exposure elimination; stacked channels; thick SU-8 resist; time-controlled UV exposure; Coatings; Electrokinetics; Fabrication; Fluidic microsystems; Interference; Microfluidics; Optical reflection; Resists; Testing; Thickness control;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location
Las Vegas, NV, USA
ISSN
1084-6999
Print_ISBN
0-7803-7185-2
Type
conf
DOI
10.1109/MEMSYS.2002.984091
Filename
984091
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