Title :
Mo/Si multilayers with different barrier layers for applications as EUV mirrors
Author :
Braun, S. ; Mai, H. ; Moss, M. ; Scholz, R.
Author_Institution :
Fraunhofer Inst. Werkstoff- und Strahltechnik, Dresden, Germany
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
Pulsed laser deposition (PLD) and magnetron sputter deposition have been used to prepare different types of Mo/Si multilayers for the EUV spectral range, First of all, the pure Mo/Si system without any additional components has been investigated. The different growth mechanisms of the layers induced by the alternative deposition methods are discussed and the resulting reflectivities and microstructures are compared. Various materials (e.g. C, B/sub 4/C, Ag, W) were tested as barrier layers at the Mo-Si interface. We have investigated their influence on reflectivity and morphology of the resulting multilayer structures.
Keywords :
diffusion barriers; interface structure; mirrors; molybdenum; optical multilayers; pulsed laser deposition; reflectivity; silicon; sputter deposition; ultraviolet spectra; Ag; B/sub 4/C; C; EUV mirrors; EUV reflectivity; EUV spectral range; HRTEM observations; Mo-Si; Mo/Si multilayers; W; barrier layers; carbon layers; diffusion layers; growth mechanisms; interface quality; magnetron sputter deposition; microstructures; pulsed laser deposition; reaction barrier layers; reflectivities; Magnetic materials; Magnetic multilayers; Microstructure; Mirrors; Morphology; Nonhomogeneous media; Optical pulses; Pulsed laser deposition; Reflectivity; Sputtering;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984103
