Mo/Si multilayers with different barrier layers for applications as EUV mirrors

Author

Braun, S. ; Mai, H. ; Moss, M. ; Scholz, R.

Author_Institution

Fraunhofer Inst. Werkstoff- und Strahltechnik, Dresden, Germany

fYear

2001

fDate

Oct. 31 2001-Nov. 2 2001

Firstpage

90

Lastpage

91

Abstract

Pulsed laser deposition (PLD) and magnetron sputter deposition have been used to prepare different types of Mo/Si multilayers for the EUV spectral range, First of all, the pure Mo/Si system without any additional components has been investigated. The different growth mechanisms of the layers induced by the alternative deposition methods are discussed and the resulting reflectivities and microstructures are compared. Various materials (e.g. C, B/sub 4/C, Ag, W) were tested as barrier layers at the Mo-Si interface. We have investigated their influence on reflectivity and morphology of the resulting multilayer structures.

Keywords

diffusion barriers; interface structure; mirrors; molybdenum; optical multilayers; pulsed laser deposition; reflectivity; silicon; sputter deposition; ultraviolet spectra; Ag; B/sub 4/C; C; EUV mirrors; EUV reflectivity; EUV spectral range; HRTEM observations; Mo-Si; Mo/Si multilayers; W; barrier layers; carbon layers; diffusion layers; growth mechanisms; interface quality; magnetron sputter deposition; microstructures; pulsed laser deposition; reaction barrier layers; reflectivities; Magnetic materials; Magnetic multilayers; Microstructure; Mirrors; Morphology; Nonhomogeneous media; Optical pulses; Pulsed laser deposition; Reflectivity; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2001 International

Conference_Location

Shimane, Japan

Print_ISBN

4-89114-017-8

Type

conf

DOI

10.1109/IMNC.2001.984103

Filename

984103