DocumentCode
2250115
Title
Stable hot spots and second breakdown in power transistors
Author
Hower, Philip L. ; Blackburn, David L. ; Oettinger, Frank F. ; Rubin, Sherwin
Author_Institution
Westinghouse Res. Labs., Pittsburgh, PA, USA
fYear
1976
fDate
8-10 June 1976
Firstpage
234
Lastpage
246
Abstract
The mechanism of hot spot formation in transistors is examined from both experimental and theoretical viewpoints. It is shown that after the device becomes thermally unstable the device may restabilize in a hot spot mode of operation. The IC, VCE thermal instability locus can accurately be predicted assuming the current density is uniform prior to hot spot formation. A new model is proposed which explains why the device may restabilize in a hot spot mode and why devices exhibit "thermal hysteresis". It is also shown using thermal mapping techniques that emitter current crowding exists in the stable hot spot mode. Finally, the experiments support the idea that second breakdown occurs when the current density within the hot spot reaches a critical value.
Keywords
current density; power transistors; semiconductor device breakdown; thermal stability; current density; emitter current crowding; power transistors; second breakdown; stable hot spot mode; thermal hysteresis; thermal instability locus; thermal mapping techniques; Current density; Electric breakdown; Equations; Mathematical model; Temperature; Thermal stability; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics Specialists Conference, 1976 IEEE
Conference_Location
Cleveland, OH
Type
conf
DOI
10.1109/PESC.1976.7072923
Filename
7072923
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