Title :
Patterned deposition of metallic nanoclusters from solution using synchrotron radiation
Author :
Divan, R. ; Mancini, D.C. ; Moldovan, N. ; Assoufid, L. ; Chu, Y. ; Ma, Q. ; Rosenberg, R.A.
Author_Institution :
Adv. Photon Source, Argonne Nat. Lab., IL, USA
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
High-energy x-rays produced by synchrotron radiation sources can induce nanocrystalline metallic deposition from a metal-salt solution onto an insulator. We have investigated patterned deposition of metallic nanoclusters on a silicon dioxide surface. The regularity of the deposited nanostructures and the surface morphology of the films depend on the incident x-ray dose. Most of the deposits were composed of spherical nanoparticles. Atomic force microscope (AFM) measurements suggest an average lateral grain size of about 150 nm. Energy dispersion x-ray (EDX) analysis shows that the x-ray-deposited gold is pure.
Keywords :
X-ray applications; X-ray chemical analysis; atomic force microscopy; gold; grain size; liquid phase deposition; metal clusters; metallic thin films; nanostructured materials; nanotechnology; surface structure; 150 nm; AFM; Au nanoclusters; Au-SiO/sub 2/; EDX analysis; SiO/sub 2/; SiO/sub 2/ surface; average lateral grain size; high-energy x-rays; metal-salt solution; patterned deposition; solution deposition; spherical nanoparticles; surface morphology; synchrotron radiation; Atomic force microscopy; Atomic measurements; Force measurement; Insulation; Metal-insulator structures; Nanostructures; Silicon compounds; Surface morphology; Synchrotron radiation; X-rays;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984147
