DocumentCode
2250372
Title
Prototyping of field emitter array using focused ion and electron beams
Author
Jarupoonphol, W. ; Ochiai, C. ; Takai, M. ; Hosono, A. ; Okuda, S.
Author_Institution
Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Japan
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
184
Lastpage
185
Abstract
Maskless prototyping of metal-gated field emitter arrays with pyramid-shape emitter was made using a dual beam system consisting of focused ion beam (FIB) and electron beam (EB) to develop emission current stability, emitter durability and high anode current.
Keywords
electron beam applications; electron field emission; focused ion beam technology; vacuum microelectronics; dual beam system; electron beam; fabrication process; focused ion beam; maskless prototyping; metal-gated field emitter array; Cathode ray tubes; Design engineering; Electron beams; Field emitter arrays; Gold; Materials science and technology; Niobium; Prototypes; Voltage; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984151
Filename
984151
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