DocumentCode :
2250373
Title :
Optimized indium oxide films prepared by DC magnetron sputtering
Author :
Axelevitch, A. ; Rabinovitch, E. ; Golan, G.
Author_Institution :
Open Univ. Israel, Holon, Israel
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
162
Abstract :
Transparent conductive coatings with high electrical conductivity and maximum optical transparency attracts much attention in recent years. Most of the works published till present in this field were concentrated in the physical analysis and design of thin film coatings. In our work we present a different approach to the fabrication design of transparent conductive thin films. Instead of analyzing complex physical models of the final product, a linear mathematical model to control the processing stages of these films is applied. The linear model is based on a mathematical approach which optimizes the processing parameters to yield best coating performance.
Keywords :
electrical conductivity; indium compounds; semiconductor growth; semiconductor materials; semiconductor thin films; sputtered coatings; transparency; DC magnetron sputtering; In/sub 2/O/sub 3/; electrical conductivity; fabrication; indium oxide thin film; linear mathematical model; optical transparency; optimization; processing parameters; transparent conductive coating; Coatings; Conductive films; Conductivity; Indium; Magnetic analysis; Mathematical model; Optical device fabrication; Optical films; Process control; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1997.621102
Filename :
621102
Link To Document :
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