• DocumentCode
    2251
  • Title

    Epitaxial Single and Double Nanolayers of {\\rm SnO}_{2} and {\\rm TiO}_{2} for Resistive G

  • Author

    Rosental, A. ; Tarre, A. ; Gerst, A. ; Kasikov, A. ; Jun Lu ; Ottosson, M. ; Uustare, T.

  • Author_Institution
    Inst. of Phys., Univ. of Tartu, Tartu, Estonia
  • Volume
    13
  • Issue
    5
  • fYear
    2013
  • fDate
    May-13
  • Firstpage
    1648
  • Lastpage
    1655
  • Abstract
    Rutile TiO2 (1 0 1) and cassiterite SnO2 (1 0 1) epitaxial single and double nanolayers, the latter stacked in either sequence, are atomic layer deposited on r -cut α-Al2O3(0 1 ̅ 2) substrates. Thickness of the layers is varied. Epitaxial quality of the films is characterized by X-ray diffraction (XRD), reflection high-energy electron diffraction, and transmission electron microscopy. In gas response measurements, as-grown films and the films coated with electron-beam evaporated Pt nanoclusters are exposed, at 350°C, to H2, CO, and CH4 diluted in air. In response to test gas concentrations of 30 parts per million (ppm), the films with a thickness of order of 10 nm exhibit, depending on the makeup and gas, as high as two- to five-fold decrease in the resistance. It is shown that the platinum surface catalyst is effective in accelerating the response and recovery processes. The transition times of the order of a few tens of seconds are observed. The results demonstrate the feasibility of gas sensing with single-crystal-like nanolayer films. Comparison of sensor characteristics of such quasi-2D nanostructures and the literature data relevant to individual nanowires, nanorods, and nanobelts, i.e., typical representatives of the quasi-1D structures, shows that, as to H2, CO, and CH4, both structures are worthy competitors.
  • Keywords
    X-ray diffraction; gas sensors; tin compounds; titanium compounds; SnO2; TiO2; X-ray diffraction; double nanolayers; electron-beam; epitaxial single; gas response measurements; platinum surface catalyst; reflection high-energy electron diffraction; resistive gas sensors; single-crystal-like nanolayer films; transmission electron microscopy; Atomic layer deposition; Epitaxial growth; Resistance; Sensors; Substrates; Atomic layer deposition (ALD); epitaxy; nanostructuring; thin film sensors;
  • fLanguage
    English
  • Journal_Title
    Sensors Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1530-437X
  • Type

    jour

  • DOI
    10.1109/JSEN.2013.2238227
  • Filename
    6407673