Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (I) - Development of subpicosecond pulse radiolysis and relation between space resolution and radiation-induced reactions

To fabricate a structure with nanoscale dimension or even with the line edge roughness of less than several nanometers, it is important to understand the early process of radiation chemistry in resist materials. In this paper, we focussed on the early processes of radiation chemistry in the chemically amplified resists within 100 ps after irradiation in an electron beam lithography system. We constructed the subpicosecond pulse radiolysis with good signal/noise ratio to investigate radiation-induced reactions of an onium salt.