DocumentCode
2251664
Title
Experimental demonstration of locally oxidized hybrid silicon-plasmonic waveguide
Author
Desiatov, Boris ; Goykhman, Ilya ; Levy, Uriel
Author_Institution
Dept. of Appl. Phys., Hebrew Univ. of Jerusalem, Jerusalem, Israel
fYear
2011
fDate
1-6 May 2011
Firstpage
1
Lastpage
2
Abstract
We demonstrate self-aligned approach for fabrication of hybrid silicon plasmonic waveguide. The demonstrated structure provides both nanoscale confinement together with propagation length of 100 microns. Near-field measurements of propagation and coupling loss are also presented.
Keywords
integrated optics; light propagation; nanophotonics; near-field scanning optical microscopy; optical fabrication; optical losses; optical waveguides; plasmonics; silicon-on-insulator; Si; coupling loss; locally oxidized hybrid silicon-plasmonic waveguide; nanoscale confinement; near-field measurements; propagation length; self-aligned method; Optical device fabrication; Optical waveguides; Optimized production technology; Photonics; Plasmons;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-4577-1223-4
Type
conf
Filename
5951084
Link To Document